JPH0411858B2 - - Google Patents

Info

Publication number
JPH0411858B2
JPH0411858B2 JP56171570A JP17157081A JPH0411858B2 JP H0411858 B2 JPH0411858 B2 JP H0411858B2 JP 56171570 A JP56171570 A JP 56171570A JP 17157081 A JP17157081 A JP 17157081A JP H0411858 B2 JPH0411858 B2 JP H0411858B2
Authority
JP
Japan
Prior art keywords
weight
parts
ester
resin composition
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56171570A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5872140A (ja
Inventor
Eiichi Ootani
Kengo Kobayashi
Shigeki Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP17157081A priority Critical patent/JPS5872140A/ja
Publication of JPS5872140A publication Critical patent/JPS5872140A/ja
Publication of JPH0411858B2 publication Critical patent/JPH0411858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
JP17157081A 1981-10-26 1981-10-26 光硬化性樹脂組成物 Granted JPS5872140A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17157081A JPS5872140A (ja) 1981-10-26 1981-10-26 光硬化性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17157081A JPS5872140A (ja) 1981-10-26 1981-10-26 光硬化性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS5872140A JPS5872140A (ja) 1983-04-30
JPH0411858B2 true JPH0411858B2 (en]) 1992-03-02

Family

ID=15925589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17157081A Granted JPS5872140A (ja) 1981-10-26 1981-10-26 光硬化性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS5872140A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5951962A (ja) * 1982-09-20 1984-03-26 Taiyo Ink Seizo Kk 光硬化型インキ組成物
JPS61132947A (ja) * 1984-11-30 1986-06-20 Hitachi Chem Co Ltd 感光性樹脂組成物
JP4218944B2 (ja) * 2003-03-28 2009-02-04 三菱レイヨン株式会社 硬化性組成物及びその硬化被膜を有する物品
KR100522002B1 (ko) * 2003-09-22 2005-10-18 주식회사 코오롱 액상 포토 솔더 레지스트 조성물 및 이로부터 제조된 포토솔더 레지스트 필름

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5825371A (ja) * 1981-08-06 1983-02-15 Toyobo Co Ltd 紫外線硬化型印刷回路用インキ組成物

Also Published As

Publication number Publication date
JPS5872140A (ja) 1983-04-30

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